Conference "High-k oxides by ALD"

Hotel Jasek Premium, Wrocław, Poland, March 7th - 10th, 2018

Program of the Conference


The detailed program and abstract book of the "High-k oxides by ALD" Conference is available here.


Wednesday   March 7th, 2018
Arrival & Registration
18:00 - 20:00 Dinner
20:00 - 22:00 "Get together"
Thursday   March 8th, 2018
8:50 - 9:00 Marek Godlewski - Conference opening address
9:00 - 9:20 Harm Knoops, Atomic Layer Deposition for Perovskite Solar Cells - Th1
9:20 - 9:40 Rafał Pietruszka, Innovative solar cell structures based on oxides films - Th2
9:40 - 10:00 David Tröger, TiOx based Passivation as full area Contacts for Si Solar Cells - Th3
10:00 - 10:20 Małgorzata Kot, Application of ALD-Al2O3 in Perovskite Solar Cells - Th4
10:20 - 10:40 Konrad Wojciechowski, Atomic layer deposition in perovskite solar cells - Th5
10:40 - 11:20 Coffee Break
11:20 - 11:40 Maciej Sawicki, Metal-Oxide-Semiconductor Structures of Ferromagnetic Semiconductors - Th6
11:40 - 12:00 Maxim Kozodaev, Improved ferroelectric performance of La:Hf0.5Zr0.5O2 thin films - Th7
12:00 - 12:20 Franciszek Krok, Formation of crystalline conductive titanium oxide (TiO) nanowires on reduced SrTiO3(100) - Th8
12:20 - 12:40 Martin Knaut, Atomic layer deposition and 3D nanoscale substrates - nanowires, nanotubes and nanopores - Th9
12:40 - 13:00 Christoph Hossbach, Properties of some rare-earth oxide films grown by Atomic Layer Deposition - Th10
13:00 - 14:20 Lunch
14:20 - 14:40 Anna Słońska-Zielonka, Novel oxide materials with antibacterial properties deposited by low-temperature ALD - Th11
14:40 - 15:00 Michal M. Godlewski, Oxide nanoparticles as a novel carrier of drugs through the blood-brain barrier - Th12
15:00 - 15:20 Izabela Serafińska, High-k Oxide Nanolayers – the Future of Medicine - Th13
15:20 - 15:40 Violetta Sessi, Integration of dielectric and ferroelectric ALD layers in silicon nanowire-based devices - Th14
15:40 - 16:00 Sebastian Killge, High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating - Th15
16:00 - 17:00 Coffee Break
17:00 - 18:00 POSTER SESSION See list of posters
19:00 - ??? Conference Banquet
Friday   March 9th, 2018
9:00 - 9:20 Christian Wenger, Optimized Switching Performance of HfO2‐based Resistive Memory Arrays - Fr1
9:20 - 9:40 Ulrich Böttger, Ultra-fast resistive switching in tantalum oxide thin films - Fr2
9:40 - 10:00 Melanie Herzig, Investigation And Optimization Of NbOx-based Threshold Switching Devices For Neuromorphic Computing - Fr3
10:00 - 10:20 Luca Di Piazza, Comparison Of Ferroelectric Doped Al:HfO2 And Si:HfO2 Capacitors With Silicon As Electrodes For Memory Applications - Fr4
10:20 - 10:40 Igor Stolichnov, Robust ferroelectricity, coexistence of phases and weak size effects in Hf1-xZrxO2 (HZO) capacitors: an insight from PFM - Fr5
10:40 - 11:20 Coffee Break
11:20 - 11:40 Sven Jachalke, Pyroelectricity of silicon-doped hafnium oxide thin films - Fr6
11:40 - 12:00 Clemens Mart, Wake-up effect of pyroelectric response in doped HfO2 - Fr7
12:00 - 12:20 Sven Kirbach, Piezoelectricity In Si-doped HfO2 Thin Films - Fr8
12:20 - 12:40 Andris Anspoks, Local structural investigation of Hafnia-Zirconia Polymorphs by extended x-ray absorption spectroscopy (EXAFS) - Fr9
12:40 - 13:00 Andrei Zenkevich, Potential Distribution Across Ferroelectric-HfO2 Based Memory Capacitors Measured by Operando HAXPES - Fr10
13:00 - 14:20 Lunch
14:20 - 14:40 Dieter Schmeißer, Ionicity and inhomogeneous charge distribution by polarons and excitons in Hafnia - Fr11
14:40 - 15:00 Max Falkowski, Impact Of Small Scale Doping Inhomogeneity In HfO2 On Phase Stability: An Ab Initio Study - Fr12
15:00 - 15:20 Alfred Kersch, A Model Of Crystallization Kinetics In Hafnia-Zirconia Based On Ab Initio Data - Fr13
15:20 - 15:40 Fenja Berg, Processing of sputtered ferroelectric hafnium oxide - Fr14
15:40 - 16:00 Terence Mittmann, Comparison of ferroelectric properties in ALD vs. PVD deposited Hf1-xZrxO2 films - Fr15
16:00 - 16:40 Coffee Break
16:40 - 17:00 Monica Materano , Built-in bias generation in ZrO2-based AFE-Capacitors - Fr16
17:00 - 17:20 Min Hyuk Park, Structural origin of temperature dependent ferroelectricity in fluorite structured ferroelectrics for various energy - related applications - Fr17
17:20 - 17:40 Tony Schenk, Stress and Texture in HfO2-based Ferroelectric Thin Films - Fr18
17:40 - 17:50 Marek Godlewski - Conference closing address
18:00 - 19:00 Dinner
Saturday   March 10th, 2018
Breakfast & Departure